Alim, Risha Famelia Auliasari (2020) Pengaruh Laju Alir Gas Argon Pada Plasma Sputtering Karbon Di Atas Quartz Crystal Microbalance (Qcm) Terhadap Karakter Plasma. Sarjana thesis, Universitas Brawijaya.
Abstract
Penelitian mengenai karakterisasi plasma argon pada deposisi lapisan tipis karbon telah dilakukan. Proses deposisi lapisan tipis karbon menggunakan metode plasma sputtering. Plasma dibangkitkan dengan variasi laju alir 60, 70, 80, 90, and 100 ml/menit, tekanan 100 Pa, DC bias -600 V, waktu deposisi 30 menit, temperatur substrat 150oC dan tegangan RF 190 volt Karakterisasi plasma menggunakan Optical Emission Spectroscopy (OES) dengan acuan database NIST. Spesies plasma yang dominan adalah Ar I. Temperatur elektron dihitung dengan menggunakan plot Boltzmann. Densitas elektron dihitung dengan menggunakan pelebaran stark. Kenaikan laju alir mengakibatkan penurunan nilai temperatur elektron. Penurunan nilai temperatur elektron disebabkan karena distribusi energi yang diterima oleh masing – masing partikel berkurang. Kenaikan laju alir mengakibatkan kenaikan densitas elektron. Peningkatan densitas elektron disebabkan karena peluang terjadinya proses ionisasi meningkat.
English Abstract
In this research, the characterization of argon plasma in the deposition of carbon has been investigated. Deposition of carbon thin film used plasma sputtering method. Plasma was generated with varied flow rate 60, 70, 80, 90, dan 100 ml/min, pressure 100 Pa, DC bias -600 V, 30 minute deposition time, substrate temperature 150oC dan RF voltage 190 volts. Characterization of plasma used Optical Emission Spectroscopy (OES) and NIST database as a reference. The identification of species plasma showed dominant species was Ar I. Electron temperature was calculated using the Boltzmann plot. Electron density was calculated using the Stark broadening. Electron temperature decreased by the increasing flow rate. The decreasing electron temperature caused by the decreasing of distribution each particle received. Electron density increased by the increasing flow rate. The increasing electron density caused by the increasing probability of ionization of particles.
Other obstract
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| Item Type: | Thesis (Sarjana) |
|---|---|
| Identification Number: | 0520090215 |
| Uncontrolled Keywords: | Plasma Sputtering, Laju Alir, Plasma Argon, Temperatur Elektron, dan Densitas Elektron. |
| Subjects: | 500 Natural sciences and mathematics > 530 Physics > 530.4 States of matter > 530.44 Plasma physics |
| Divisions: | Fakultas Matematika dan Ilmu Pengetahuan Alam > Fisika |
| Depositing User: | ismanto |
| Date Deposited: | 16 Feb 2021 12:08 |
| Last Modified: | 22 Jul 2022 03:45 |
| URI: | http://repository.ub.ac.id/id/eprint/183162 |
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Text (DALAM MASA EMBARGO)
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