Saputra, Kristian Agustinus Teguh (2019) Studi Pengaruh Jarak Substrat Dengan Bahan Target Terhadap Pembentukan Lapisan Tipis Karbon Di Atas Permukaan Kaca Dengan Plasma Sputtering. Sarjana thesis, Universitas Brawijaya.
Abstract
Sistem plasma RF untuk variasi jarak substrat dengan bahan target telah dirancang dan telah dilakukan studi mengenai pengaruh jarak substrat terhadap pembentukan lapisan tipis karbon di atas substrat kaca dengan plasma sputtering. Perancangan sistem plasma RF dilakukan dengan penambahan beberapa alat seperti holder bahan target, pemanas substrat, sambungan input pemanas dan termokontrol, saringan, dan flowcontrol. Deposisi karbon dilakukan pada kondisi tekanan chamber 40 Pa, laju aliran gas argon 60 ml/mnt, tegangan RF 100 volt, suhu substrat 200oC, waktu deposisi 60 menit, dan variasi jarak substrat dengan bahan target 30 mm, 42,5 mm, dan 50 mm. Pengamatan spesies plasma dilakukan dengan Optical Emission Spectroscopy (OES) Aurora-4000 dan pengamatan permukaan substrat kaca dengan mikroskop optik. Intensitas plasma argon berkurang (spesies Ar I dan Ar II) dengan jarak substrat dan bahan target diperbesar. Muncul plasma karbon (spesies C I dan C II) pada saat deposisi. Terbentuk islands (pulau-pulau) dari karbon di atas permukaan kaca setelah dilakukan deposisi.
English Abstract
RF plasma system for target to substrate distance variation had built and carbon thin film growth on the glass surface influenced by target to substrate distance with plasma sputtering had done. RF plasma system was built by add some parts to the system like target holder, substrate heater, input voltage for substrate heater and thermocontrol, pressure gauge filter and flowcontrol. Deposition prosess was occurred with 40 Pa gas pressure in tha chamber, argon flowrate 60 ml/mnt, 100 volt RF input, substrate temperature 200 oC, 60 minutes deposition, and some variation for target to substrate distance 30 mm, 42,5 mm and 55 mm. Optical Emission Spectroscopy (OES) Aurora-4000 was used to observe plasma species while deposition process was held. Glass surface was observed using optical microscope. Argon plasma intensity is decreasing when target o substrate distance is increase. Plasma carbon occurred while deposition process was held and there are C I and C II species was observed. Deposition process produce island growth model on the glass surface.
Other obstract
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| Item Type: | Thesis (Sarjana) |
|---|---|
| Identification Number: | SKR/MIPA/2019/259/051911039 |
| Uncontrolled Keywords: | sistem plasma RF, jarak substrat dengan bahan target, spesies plasma, lapisan tipis karbon, RF plasma system, target to substrate distance, plasma species, carbon thin film |
| Subjects: | 500 Natural sciences and mathematics > 546 Inorganic chemistry > 546.6 Groups 8, 9 ,10, 11, 12, 13, 14 > 546.68 Group 14 > 546.681 Carbon |
| Divisions: | Fakultas Matematika dan Ilmu Pengetahuan Alam > Fisika |
| Depositing User: | Budi Wahyono Wahyono |
| Date Deposited: | 21 Jul 2020 12:52 |
| Last Modified: | 31 Jul 2020 07:07 |
| URI: | http://repository.ub.ac.id/id/eprint/179632 |
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