Yunata, ErsyzarioEdo (2012) Plasma Diagnosis untuk Proses Plasma Etching dan Ashing pada Diamond Carbon Coating. Magister thesis, Universitas Brawijaya.
Abstract
Diamond like carbon (DLC) telah banyak digunakan sebagai lapisan pelindung yang efisien dan dapat diandalakan. Untuk mendaur ulang komponen mold-die, lapisan DLC yang ada harus dihilangkan secara menyeluruh tanpa merusak lapisan yang lainnya. Sistem RF-DC plasma etching digunakan untuk menggambarkan perilaku proses plasma etching atau ashing dengan menggunakan analisa spektroskopi. Pertama-tama, tegangan RF dan DC, serta tekanan dilakukan variasi sehingga didapatkan kondisi yang ideal. Kondisi ideal didapatkan dengan keadaan DC bias -450 V, tegangan RF 250 V, dan tekanan gas oksigen 40 Pa. Spektrum dari plasma oksigen dianalisa untuk mendefinisikan plasma oksigen murni. Dimana plasma oksigen terdiri dari atom oksigen, atom oksigen aktif, dan molekul oksigen. Pengukuran In situ plasma juga digunakan untuk mendeteksi CO peaks pada panjang gelombang 200-300 nm. Hasil pendeteksian CO peak membuktikan bahwa karbon dalam lapisan DLC bereaksi dengan oksigen, yaitu C (di dalam DLC) + O → CO.
English Abstract
Diamond-like carbon (DLC) coating has been widely used as an efficient and reliable protective coating. To recycle the mold-die substrates, the used DLC coating must be perfectly removed before re-coating without damage to substrates and residuals. The RF-DC high dense plasma etching or ashing process is utilized to describe the plasma-etching behavior by using the spectroscopic analysis. First, RF- and DC-voltages together with pressure are varied in this oxygen plasma etching to search for an optimum condition; DC-bias is -450 V, RF voltage is 250 V and oxygen gas pressure 40 Pa. Oxygen plasma spectrum is analyzed to define the pure oxygen plasma. It is composed of oxygen atoms, activated oxygen atoms, and molecules. In-situ plasma monitoring is also used to measure CO peak in the range 200-300 nm. Detection of CO peak proves that carbon in DLC coating is reacted with oxygen flux; i.e. C (in DLC) + O → CO. Variation of CO peaks correspond to etching behavior.
| Item Type: | Thesis (Magister) |
|---|---|
| Identification Number: | TES/530.44/YUN/p/041200057 |
| Subjects: | 500 Natural sciences and mathematics > 530 Physics > 530.4 States of matter |
| Divisions: | S2/S3 > Magister Matematika, Fakultas MIPA |
| Depositing User: | Endro Setyobudi |
| Date Deposited: | 26 Apr 2012 12:10 |
| Last Modified: | 26 Apr 2012 12:10 |
| URI: | http://repository.ub.ac.id/id/eprint/157499 |
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