Rajapadni, Maharani Suci (2018) Pengerasan Titanium Murni Menggunakan Metode Plasma Nitriding Pada Temperatur Rendah. Magister thesis, Universitas Brawijaya.
Abstract
Titanium telah banyak diaplikasikan dalam berbagai bidang industri dan sektor medis. Namun properti tribologi yang rendah menjadi penyebab keterbatasan penggunaan titanium dalam beberapa bidang. Telah banyak dilakukan penelitian tentang modifikasi permukaan titanium untuk meningkatkan properti mekanik dari titanium. Pada beberapa penelitian, titanium telah berhasil ditingkatkan kekerasan permukaannya dengan menggunakan proses plasma nitriding pada temperatur di atas 500 0C dan durasi nitriding lebih dari 5 jam. Pada penelitian ini, proses plasma nitriding pada temperatur rendah dilakukan untuk mengeraskan permukaan titanium murni jenis industrial kelas I. Temperatur spesimen selama proses plasma nitriding yang digunakan bervariasi yakni, 350, 375, 400, 425, and 450 0C dengan campuran gas N2 80% dan H2 20%, selama 4 jam. Ketebalan lapisan nitrida yang terbentuk pada permukaan titanium ternitridasi bernilai 18 hingga 20 μm untuk temperatur 400, 425, and 450 0C. Kekerasan permukaan titanium bervariasi dari 550 hingga 1900 HV bergantung pada temperatur. Struktur kristal hcp titanium mengalami ekspansi kisi dengan disertai pembentukan presipitat halus Ti2N and TiN pada permukaan.
English Abstract
Titanium has been widely utilized in industrial sector. The low tribological performance of titanium is a major drawback, which limits its industrial applications. Many surface engineering processes have been developed to improve the surface properties. In most recent works, titanium was successfully plasma nitrided above 500 0C and for longer processing time than 5 hours. In this work, the low temperature plasma nitriding was proposed to harden the pure titanium in industrial grade I. The holding temperatures was varied by 350, 375, 400, 425, and 450 0C with gas mixture of 80% N2 to 20% H2, for 4 hours. The obtained thickness of the nitride layer was 18 up to 20 μm for treatment temperature 400, 425, and 450 0C. The hardness was varied between 550 up to 1900 HV after plasma nitriding process depending on the process temperature. No transformation took place. The original hcp-structured lattices expanded themselves with formation of Ti2N and TiN fine precipitated at the surface.
Other obstract
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| Item Type: | Thesis (Magister) |
|---|---|
| Identification Number: | TES/530.44/RAJ/p/2018/041808820 |
| Uncontrolled Keywords: | TITONIUM, PLASMA (IONIZED GASES) |
| Subjects: | 500 Natural sciences and mathematics > 530 Physics > 530.4 States of matter > 530.44 Plasma physics |
| Divisions: | S2/S3 > Magister Fisika, Fakultas MIPA |
| Depositing User: | Endang Susworini |
| Date Deposited: | 04 Mar 2020 02:29 |
| Last Modified: | 04 Mar 2020 02:29 |
| URI: | http://repository.ub.ac.id/id/eprint/179868 |
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